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Semiconductor wafer cleaning using solvents to remove organic and inorganic contamination is essential for consistent nano fabrication processing. Adhesion issues of resist or limited wet etching capabilities could prevent a successful process flow. Plasma treatment of silicon / silicon dioxide surface can help increase the hydrophobic or hydrophilic properties of the material. Oxide etching with HF should always be done V with dedicated tools and PPE, not like this operator in the reel. #wet #p
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