The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes despite an almost perpetual ...

The SZX10 is specially designed for routine research. With a maximum numerical aperture (NA) of 0.2, producing a resolution of 600 line pairs per millimeter and a zoom ratio of 10:1, more information ...

Dutch company ASML has made a lot of news over the past six months by unveiling the world's first High-NA (numerical aperture) lithography machine. The cutting-edge device offers upgraded specs and ...

The NW Iberian Peninsula (NWIP) coast includes a large diversity of estuarine systems such as Rias, river estuaries and coastal lagoons, being characterized by a high primary production, responsible ...

Researchers in the US have unveiled a handheld confocal microscope capable of capturing high-resolution images at video frame rates. The key to achieving this sought after combination is a MEMS ...

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...

The semiconductor equipment giant ASML and electronics research center imec have opened a joint laboratory dedicated to high-numerical aperture (high-NA) extreme ultraviolet (EUV) lithography, seen by ...

AMSTERDAM, May 27 (Reuters) - Taiwan Semiconductor Manufacturing Co (2330.TW), the world's largest contract chipmaker, is still assessing when it will use ASML's cutting-edge high numerical aperture ...