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Joint research validates new semiconductor etching process, achieving five times speed improvement

A collaborative research team from Nagoya University and Tokyo Electron Miyagi Ltd. has demonstrated that the company's new ...
Eureka

Tokyo Electron and Nagoya University Develop Ultra-Fast HF Plasma Etching

Discover Tokyo Electron’s new semiconductor etching method for faster, greener, and precise chip production. Read more ...
Semiconductor Engineering

Cryogenic Etch: A Key Enabler Of 3D NAND

Released every 12 to 18 months, 3D NAND scaling outpaces most other semiconductor devices in replacement rate and performance ...