Archer 300 LCM systems have been shipped to major memory and logic semiconductor manufacturers worldwide, where they will be used for overlay applications in advanced development and high-volume ...
“In order to continue scaling devices to meet Moore's law, chip manufacturers are extending 193nm immersion lithography using multi-patterning techniques and are assessing non-traditional patterning ...
SAN JOSE, Calif. — KLA-Tencor Corp. introduced its latest overlay metrology tool for the 65-nm node and beyond. Based on its Archer tool platform, the new Archer AIM+ reduces total measurement ...
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